상품명 | Single layer h-BN (Boron Nitride) film grown on copper foil: 2" x 1" |
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상품요약정보 | Single layer h-BN (Boron Nitride) film grown in copper foil. |
국내·해외배송 | 국내배송 |
배송방법 | 택배 |
배송비 | 2,500원 (50,000원 이상 구매 시 무료) |
SNS 상품홍보 | |
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상품명 | 상품수 | 가격 |
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Single layer h-BN (Boron Nitride) film grown on copper foil: 2" x 1" | 0 ( ) |
할인가가 적용된 최종 결제예정금액은 주문 시 확인할 수 있습니다.
h-BN is an insulator with a direct band gap of 5.97 eV. Due to its strong covalent sp2 bonds in the plane, the in-plane mechanical strength and thermal conductivity of h-BN has been reported to be close to that of graphene. h-BN has an even higher chemical stability than graphene; it can be stable in air up to 1000 °C (in contrast, for graphene the corresponding temperature is 600 °C).
During Chemical Vapor Deposition, BN is grown on both sides of the copper foil
Close to complete coverage (90-95%), with some minor holes
Thickness of the copper foil is 25 microns
High crystalline quality, see SAD (Selected area [electron] diffraction) data
Quality is confirmed by TEM. TEM shows perfect hexagonal structure.
We now offer larger sizes of single layer hBN on copper foil (max size is 6"x6"). Please contact us at info@graphenelab.com for pricing and availability.
If transferred onto an SiO2 substrate, the BN film may be seen as a white film. However, it is difficult to recognize the BN film on copper using a microscope.
Transfer: PMMA Procedure, similar to that of graphene. It may be transferred on most substrates, which we may do in-house as custom work.Academic References:Ki Kang Kim, et. al. Synthesis of Monolayer Hexagonal Boron Nitride on Cu Foil Using Chemical Vapor Deposition. Nano Lett., 2012, 12 (1), pp 161–166 Ki Kang Kim, et. al. Synthesis and Characterization of Hexagonal Boron Nitride Film as a Dielectric Layer for Graphene Devices, ACS Nano, 2012, 6 (10), pp 8583–8590 |
SKU | CVD-2X1-BN |
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2 | 상품 견적 문의드립니다. | 박**** | 2022-11-15 | 1 | |
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